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Browse Journals & Magazines > Computer-Aided Design of Inte ...> Volume:1 Issue:3 Help

Statistical Simulation of the IC Manufacturing Process

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2 Author(s)
Maly, W. ; Department of Electrical Engineering, Carnegie-Mellon University, Pittsburgh, PA, USA ; Strojwas, A.J.

Information about the random behavior of the IC manufacturing process can be applied for IC and process design tasks. In this paper a methodology for modeling random fluctuations of IC manufacturing process is proposed. A simulator of a complete bipolar manufacturing process called FABRICS, is described. A few applications illustrating advantages of the proposed statistical process modeling method are discussed.

Published in:
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on  (Volume:1 ,  Issue: 3 )

Date of Publication: July 1982

Page(s):
120 - 131
ISSN :
0278-0070
Digital Object Identifier :
10.1109/TCAD.1982.1270003
Product Type:
Journals & Magazines
Date of Current Version :
03 March 2004
Issue Date :
July 1982
Sponsored by :
IEEE Council on Electronic Design Automation

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