By Topic

A micromachined silicon scan tip for an atomic force microscope

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Kong, L.C. ; Dept. of Phys., Michigan Univ., Ann Arbor, MI, USA ; Orr, B.G. ; Wise, K.D.

The development of single-channel and multichannel scan tips for use in atomic force microscopy is described. A combination of bulk and surface micromachining techniques has been utilized to fabricate a heavily doped single-crystal silicon microprobe with integrated polysilicon scan tips. Polysilicon beams, configured both as cantilevers and as double-end-clamped structures 75-200 mu m long and approximately 30 mu m wide with a thickness of 1-1.5 mu m have been fabricated. The fabrication process utilizes an undoped polysilicon sacrificial layer and a boron-doped polysilicon release structure. By careful choice of the passivation layers, the strain in the structure can be reproducibly controlled. The beams are driven electrostatically, and the response amplitude is sensed using interferometric techniques.<>

Published in:

Solid-State Sensor and Actuator Workshop, 1990. 4th Technical Digest., IEEE

Date of Conference:

4-7 June 1990