Linear compatible I/SUP 2/L technology with high voltage transistors

A technology is proposed in which it is possible to realize both I/SUP 2/L circuits and linear transistors with V/SUB CBO/ of 60 V. The essential step in such a technology is an additional n/SUP +/-flat diffusion. The technological parameters are derived. From measurements on wafers processed in the outlined technology. The author established functioning I/SUP 2/L elements and high voltage transistors.