The emission properties of the nanodiamond films produced in CH/sub 4//CO/sub 2/ microwave plasma

The introduction the carbon dioxide into CH/sub 4/ plasma for the synthesis of diamond films on Si has been studied by many authors, mainly for deposition high quality diamond films at a relative low temperature. The aim of this report is to show, that under the certain conditions it is possible to obtain a good electron emitting films in CO/sub 2/ + CH/sub 4/ gas mix by MW CVD process.