Avalanche multiplication in Al/sub x/Ga/sub 1-x/As (x=0 to 0.60)

Electron and hole multiplication characteristics, M/sub e/ and M/sub h/, have been measured in Al/sub x/Ga/sub 1-x/As (x=0-0.60) homojunction p/sup +/-i-n/sup +/ diodes with i-region thicknesses, w, from 1 /spl mu/m to 0.025 /spl mu/m and analyzed using a Monte Carlo model (MC). The effect of the composition on both the macroscopic multiplication characteristics and microscopic behavior is therefore shown for the first time. Increasing the alloy fraction causes the multiplication curves to be shifted to higher voltages such that the multiplication curves at any given thickness are practically parallel for different x. The M/sub e//M/sub h/ ratio also decreases as x increases, varying from /spl sim/2 to /spl sim/1 as x increases from 0 to 0.60 in a w=1 /spl mu/m p/sup +/-i-n/sup +/. The Monte-Carlo model is also used to extract ionization coefficients and dead-space distances from the measured results which cover electric field ranges from /spl sim/250 kV/cm-1200 kV/cm in each composition. These parameters can be used to calculate the nonlocal multiplication process by solving recurrence equations. Limitations to the applicability of field-dependent ionization coefficients are shown to arise however when the electric-field profile becomes highly nonuniform.