Top-down and bottom-up approaches to high-density bit-patterned media

We develop processes relevant to bit-patterned media (BPM) to achieve nanostructures with densities of up to 4.4 Tdots/in
²
using a combination of top-down electron-beam lithography and bottom up self assembly of Au nanoparticles. Evaluation of magnetic bits were performed on purely top-down approaches using both direct-deposition and ion milling processes. Measurements of BPM performance were performed to investigate the effects of trench material, and process conditions.