Characterization study of plasma polymerized hexamethyldisiloxane thin films

In this paper, we investigated characteristics of hexamethyldisiloxane thin films by plasma polymerization. Thin films were prepared by interelectrode capacitively coupled type apparatus and in conditions with carrier gas flow rate of 11 [cc/min], gas pressure of 0.1 [Torr], discharge frequency of 13.56 [MH/sub z/] and discharge power of 30-90 [W]. The relative dielectric constant and dielectric loss tangent of thin films showed 3.212-3.805 and 0.0026 /spl sim/0.0451 in alternating frequency of 10/sup 3/-10/sup 6/ [Hz].