Ridged LiNbO$_{3}$ Waveguide Fabricated By a Novel Wet Etching/MeV Oxygen Ion Implantation Method

We report on a new wet etching/ion implantation method for fabricating ridge waveguide on
z
-cut LiNbO
₃
. The ridge structures are produced on LiNbO
₃
crystal by anisotropic wet etching via minus
z
face. Mode guiding at wavelength of 632.8 nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.