Overview of CMOS Technology Development in the MIRAI Project

Funded by the New Energy and Industrial Technology Development Organization, the Millennium Research for Advanced Information Technology Project (MIRAI) provided technology solutions for the half-pitch 65nm technology node in its 1st Phase (2001-2003), and half-pitch 45nm and beyond in its 2nd Phase(2004-2007). Phase 3 will provide technical solutions for ultrascaled CMOS, nano-silicon integration and EUV lithography.