PtRh resistors for Si compatible low-T/sub c/ Josephson technology

A PtRh resistor has been developed as an integral part of an advanced planarized low-T/sub c/ Josephson technology that is compatible with Si integrated circuit processing. Electron-beam evaporated from a single source, the PtRh films have a sheet resistance well controlled in the range of 3-20 /spl Omega//square that is independent of temperature from 4.2 K down to at least 10 mK. The contact resistivity between PtRh, with a sheet resistance of 5 /spl Omega//square and Nb interconnects is typically 0.7 /spl Omega//spl middot//spl mu/m.<
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