Single crystal nanoresonators at 100 MHz fabricated by a simple batch process

Nanoresonators with resonant frequency until 100 MHz and with Q-factors until 15000 were realized in a single crystal <100> standard silicon wafer, using standard UV photolithography and anisotropic etching with TMAH. Their cross-section is triangular, with edges following <111> and <100> planes, and they are aligned along the {110} direction. While the resonant frequency decreases with the increase of the length, as expected, the Q factor shows quite different values between the two tested batch process. This is due to the connecting parts of the resonators to the bulk, which differs in the two batch process, with one giving more dissipation losses than the other one.