Avalanche photodiodes with separate absorption and multiplication regions grown by metalorganic vapor deposition

InP/InGaAs avalanche photodiodes with separate absorption and multiplication regions (SAM APD's) have been fabricated from wafers grown by atmospheric-pressure metalorganic chemical vapor deposition. These APD's exhibit low dark current and good quantum efficiency. The pulse response exhibits the two-component response typical of the SAM-APD structure. The slow component is 6 ns and the fast component is 100 ps.