High-performance nonvolatile HfO2 nanocrystal memory

We demonstrate high-performance nonvolatile HfO
₂
nanocrystal memory utilizing spinodal phase separation of Hf-silicate thin film by 900/spl deg/C rapid thermal annealing. With this technique, a remarkably high nanocrystal density of as high as 0.9 /spl sim/ 1.9 × 10/sup 12/ cm/sup -2/ with an average size <10 nm can be easily achieved. Because HfO
₂
nanocrystals are well embedded inside an SiO
₂
-rich matrix and due to their sufficiently deep energy level, we, for the first time, have demonstrated superior characteristics of the nanocrystal memories in terms of a considerably large memory window, high-speed program/erase (P/E) (1 μs/0.1 ms), long retention time greater than 10/sup 8/ s for 10% charge loss, and excellent endurance after 10
⁶
P/E cycles.