The leakage current study on Cu/TaSi/sub x//porous silica damascene structures

Ta-based diffusion barriers, nano-cluster TaSi/sub 0.55/, polycrystalline TaSi/sub 0.42/ and TaN, were used for the application of the Cu/porous silica damascene integration. The leakage current, bias-temperature-stress measurements, atomic force microscope, and Auger electron mapping were then investigated. The samples with nano-cluster TaSi/sub 0.55/ showed the best performance among these samples.