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LF55GN photosensitive flexopolymer as a new material for ultra-thick and high aspect-ratio MEMS fabrication

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3 Author(s)
Abdeljalil Sayah ; Institute of Microelectronics and Microsystems, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland ; Virendra K. Parashar ; Martin A. M. Gijs