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Role of {\hbox {HfO}} _{2} / {\hbox {SiO}}_{2} Gate Dielectric on the Reduction of Low-Frequent Noise and the Enhancement of a-IGZO TFT Electrical Performance

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4 Author(s)
Liang-Yu Su ; Institute of Photonics and Optoelectronics, National Taiwan University, Taipei, Taiwan ; Huang-Kai Lin ; Chia-Chin Hung ; JianJang Huang