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Note: Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact

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6 Author(s)
Zhang, Hai-Bo ; Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Department of Electronic Science and Technology, Xi''an Jiaotong University, Xi''an 710049, People''s Republic of China ; Hu, Xiao-Chuan ; Wang, Rui ; Cao, Meng
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