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Global Model of \hbox {Cl}_{2}\hbox {/Ar} High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP

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7 Author(s)
R. Chanson ; Institut des Matériaux Jean Rouxel, UMR 6502, Université de Nantes-CNRS , Nantes, France ; A. Rhallabi ; M. C. Fernandez ; C. Cardinaud
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