We developed the maskless photolithography device by modifying the optical system of an LCD projector and applied to cell micropatterning and fabrication of microchannels. Furthermore, we also developed the second-generation device allows for the fabrication of micropatterns over a larger area (over 50 Ã 50 mm). The maskless system has the big merit that doesn't need a photomask. However, there are a few problems in the maskless system. One of them is that patterns of segmentalized boundaries with an XY stage get out of shape. It is caused by optical distortion, precision of XY stage and so on. To overcome the defect, we have developed a third-generation device equipped with a more precision XY-stage and invented a method to improve patterns of divided edge by multiphase exposure. We were able to improve patterns of divided edge by the method.