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Si+ ion implantation for strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures

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7 Author(s)
Buca, D. ; Institute of Bio- and Nanosystems (IBN1-IT), Forschungszentrum Jülich, D-52425 Jülich, Germany and JARA-Fundamentals of Future Information Technology ; Minamisawa, R.A. ; Trinkaus, H. ; Hollander, B.
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