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Hydrogen in low‐pressure chemical‐vapor‐deposited silicon (oxy)nitride films

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5 Author(s)
Habraken, F.H.P.M. ; Technical Physics Department, Utrecht State Univeristy, P. O. Box 80.000, 3508 TA Utrecht, The Netherlands ; Tijhaar, R.H.G. ; van der Weg, W.F. ; Kuiper, A.E.T.
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