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Reduction of iron diffusion in silicon during the epitaxial growth of β-FeSi2 films by use of thin template buffer layers

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12 Author(s)
Liu, Zhengxin ; System Engineers’ Company, Limited, Yamato, Kanagawa 242-0001, Japan ; Suzuki, Yasuhito ; Osamura, Masato ; Ootsuka, Teruhisa
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