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Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma

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4 Author(s)
Kessels, W.M.M. ; Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands ; van de Sanden, M.C.M. ; Severens, R.J. ; Schram, D.C.