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Effect of preamorphization implantation on C54–TiSi2 formation in salicided narrow lines

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5 Author(s)
Tai, Kaori ; LSI Production Division, Oki Electric Industry Company, Ltd., 550-1, Higashi-asakawa Hachioji, Tokyo 193, Japan ; Okihara, M. ; Kageyama, Makiko ; Harada, Yusuke
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