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Nanoflash device with self-aligned double floating gates using scanning probe lithography and tetramethylammonium hydroxide wet etching

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4 Author(s)
Sheu, J.-T. ; Institute of Nanotechnology, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 30050, Taiwan and National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu Science Park, Hsinchu 30077, Taiwan ; Chen, C.C. ; You, K.S. ; Tsai, S.T.

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