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Surface processes occurring on TiSi2 and CoSi2 in fluorine-based plasmas. Reactive ion etching in CF4/CHF3 plasmas

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6 Author(s)
Baklanov, M.R. ; IMEC, Kapeldreef 75, B-3001 Leuven, Belgium ; Vanhaelemeersch, S. ; Storm, W. ; Kim, Y-B.
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