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Comment on “Etch characteristics of CeO2 thin film in Ar/CF4/Cl2 plasma” [J. Vac. Sci. Technol. A 21, 426 (2003)]

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1 Author(s)
Paparazzo, E. ; Istituto di Struttura della Materia del CNR, Area della Ricerca di Roma-Tor Vergata Via Fosso del Cavaliere 100, 00133 Roma, Italy

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