Skip to Main Content
IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards,
eBooks, and eLearning courses.
Learn more about:
IEEE Xplore subscriptions
Your organization might have access to this article on the publisher's site. To check,
click on this link:http://dx.doi.org/+10.1116/1.581995
Magnetic neutral loop discharge (NLD) plasma is a new type for dry etching process characterized by effective coupling of the input electric field electron electron motion near the magnetic neutral loop (NL) region. Therefore, dense plasma can be produced and controlled spatially by changing the position of the NL. Uniformity was controlled by changing the radius of NL temporally during the etching using a repetition frequency of 0.1 Hz, so that the deviation of the SiO2 etch rate was within 2% (3σ) on 200-mm-diam wafer. In nanoscale pattern etching processes, we found that CHF2+ ions played an important role in very high aspect ratio profile etching. In CHF2+ ion-rich plasma, ZEP photoresist patterned 20 nm space was successfully etched 800 nm in depth at the pressure of about 0.3 Pa, using CH2F2, C4F8, and O2. © 1999 American Vacuum Society.
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.