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Analysis of the improved contact resistance in metal-p+ silicon Schottky barriers using the BF2/B mixed implantation

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4 Author(s)
Lee, Jung-Ho ; Semiconductor Advanced Research Division, HYUNDAI Electronics Ind. Co. Ltd., Ichon, Kyoungki, Korea ; In-Seok Yeo ; Lee, Jeong-Youb ; Lee, Sahng-Kyoo