Skip to Main Content
| Create Account
| Sign In
IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards,
eBooks, and eLearning courses.
Learn more about:
IEEE Xplore subscriptions
Your organization might have access to this article on the publisher's site. To check,
click on this link:http://dx.doi.org/+10.1063/1.1355296
We report on epitaxial growth of ZnO films on Si(111) substrates using an epitaxial GaN buffer layer. A rf magnetron sputtering process has been developed and utilized in growing epitaxial GaN buffers on Si, and then ZnO films on the GaN-buffered Si substrates. X-ray diffraction analysis shows that both the ZnO and GaN films are of a monocrystalline wurtzite structure with an epitaxial relationship of ZnO//GaN//Si along the growth direction and ZnO[112_01]//GaN[112_0]//Si[11_0] along the in-plane direction. The successful growth of epitaxial ZnO/GaN films on Si demonstrates the feasibility and promise of integrating various functional devices on the same substrate. © 2001 American Institute of Physics.
Applied Physics Letters
Date of Publication:
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.