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Rapid thermal chemical vapor deposition of in situ boron-doped polycrystalline silicon-germanium films on silicon dioxide for complimentary-metal-oxide-semiconductor applications

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8 Author(s)
Li, V.Z-Q ; Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911 ; Mirabedini, M.R. ; Kuehn, R.T. ; Wortman, J.J.
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