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Hall effect measurements on boron‐doped, highly oriented diamond films grown on silicon via microwave plasma chemical vapor deposition

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4 Author(s)
Stoner, B.R. ; Kobe Steel USA Inc., Electronic Materials Center, 79 TW Alexander Drive, P. O. Box 13608, Research Triangle Park, North Carolina 27709 ; Kao, Chien‐teh ; Malta, D.M. ; Glass, R.C.