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click on this link:http://dx.doi.org/+10.1063/1.1464227
A methodology is developed to enable wafer scale fabrication of single-walled carbon nanotube (SWNT) tips for atomic force microscopy. Catalyst selectively placed onto 375 prefabricated Si tips on a wafer is made possible by a simple patterning technique. Chemical vapor deposition on the wafer scale leads to the growth of SWNTs protruding from more than 90% of the Si tips. This represents an important step towards the scale up of nanotube probe tips for advanced nanoscale imaging of solid-state and soft biological systems and for scanning probe lithography. © 2002 American Institute of Physics.
Applied Physics Letters
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