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Effect of N2O plasma treatment on the stabilization of water absorption in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition

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4 Author(s)
Kim, S.P. ; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, 373-1 Kusung-Dong, Yusung-Gu, Taejon 305-701, Korea ; Choi, S.K. ; Youngsoo Park ; Ilsub Chung