By Topic

Single crystalline Si islands on an amorphous insulating layer recrystallized by an indirect laser heating technique for three‐dimensional integrated circuits

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
5 Author(s)
Mukai, R. ; Fujitsu Limited, IC Development Division, Kawasaki 211, Japan ; Sasaki, N. ; Iwai, T. ; Kawamura, S.
more authors