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Fabrication and Properties of \hbox {Pt}/\hbox {Bi}_{3.15}\hbox {Nd}_{0.85} \hbox {Ti}_{3}\hbox {O}_{12}/break\hbox {HfO}_{2}/\hbox {Si} Structure for Ferroelectric DRAM (FEDRAM) FET

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5 Author(s)
Dan Xie ; Tsinghua Nat. Lab. for Inf. Sci. & Technol., Tsinghua Univ., Beijing ; Yongyuan Zang ; Yafeng Luo ; Tianling Ren
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