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Simulation parameter effects on critical dimension and sensitivity of 193 nm Chemically Amplified Resist

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6 Author(s)
Sang-Kon Kim ; Dept. of Phys., Hanyang Univ., Ansan, South Korea ; Dong-Soo Sohn ; Eun-Jung Seo ; Jin-Young Kim
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Author(s)

Sang-Kon Kim
Dept. of Phys., Hanyang Univ., Ansan, South Korea
Dong-Soo Sohn ; Eun-Jung Seo ; Jin-Young Kim ; Young-Soo Sohn ; Hye-Keun Oh