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Band offsets of Al2O3 and HfO2 oxides deposited by atomic layer deposition technique on hydrogenated diamond

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4 Author(s)
Liu, J.W. ; Optical and Electronic Materials Unit, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan ; Liao, M.Y. ; Imura, M. ; Koide, Y.

Author(s)

Liu, J.W.
Optical and Electronic Materials Unit, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
Liao, M.Y. ; Imura, M. ; Koide, Y.