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Fabrication Process for Integrating Nanoparticles With Released Structures Using Photoresist Replacement of Sublimated p-Dichlorobenzene for Temporary Support

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2 Author(s)
Yongha Hwang ; Department of Electrical Engineering, University of California, Los Angeles, CA, USA ; Rob N. Candler

Author(s)

Yongha Hwang
Department of Electrical Engineering, University of California, Los Angeles, CA, USA
Rob N. Candler