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Application of Post- \hbox {HfO}_{2} Fluorine Plasma Treatment for Improvement of \hbox {In}_{0.53}\hbox {Ga}_{0.47} \hbox {As} MOSFET Performance

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5 Author(s)
Yen-Ting Chen ; Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA ; Wang, Yanzhen ; Xue, Fei ; Zhou, Fei
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Author(s)

Yen-Ting Chen
Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
Wang, Yanzhen ; Xue, Fei ; Zhou, Fei ; Lee, Jack C.