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Excellent crystalline silicon surface passivation by amorphous silicon irrespective of the technique used for chemical vapor deposition

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6 Author(s)
Schuttauf, Jan-Willem A. ; Debye Institute for Nanomaterials Science, Nanophotonics–Physics of Devices, Utrecht University, Princetonplein 5, 3584 CC Utrecht, The Netherlands ; van der Werf, Karine H.M. ; Kielen, Inge M. ; van Sark, W.G.J.H.M.
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Author(s)

Schuttauf, Jan-Willem A.
Debye Institute for Nanomaterials Science, Nanophotonics–Physics of Devices, Utrecht University, Princetonplein 5, 3584 CC Utrecht, The Netherlands
van der Werf, Karine H.M. ; Kielen, Inge M. ; van Sark, W.G.J.H.M. ; Rath, Jatindra K. ; Schropp, Ruud E.I.