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Characteristics of \hbox {Si/SiO}_{2} Interface Properties for CMOS Fabricated on Hybrid Orientation Substrate Using Amorphization/Templated Recrystallization (ATR) Method

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8 Author(s)
Po Chin Huang ; Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan ; San Lein Wu ; Shoou Jinn Chang ; Yao Tsung Huang
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Author(s)

Po Chin Huang
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
San Lein Wu ; Shoou Jinn Chang ; Yao Tsung Huang ; Chen, J.F. ; Chien Ting Lin ; Ma, M. ; Cheng, Osbert