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Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column

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3 Author(s)
Lee, Hak-Joo ; Electronic Materials Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650, South Korea ; Jeon, Hyeongtag ; Lee, Wook-Seong

Author(s)

Lee, Hak-Joo
Electronic Materials Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650, South Korea
Jeon, Hyeongtag ; Lee, Wook-Seong