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Effects of \hbox {CF}_{4} Plasma Treatment on the Electrical Characteristics of Poly-Silicon TFTs Using a  \hbox {Tb}_{2}\hbox {O}_{3} Gate Dielectric

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3 Author(s)
Tung-Ming Pan ; Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan ; Zhi-Hong Li ; Chih-Kang Deng

Author(s)

Tung-Ming Pan
Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
Zhi-Hong Li ; Chih-Kang Deng