A key component that is sometimes overlooked in X-ray lithography is the resist material. The lithographic properties of these materials are extremely important if one is to take advantage of the superior lithographic performance often observed in X-ray lithography. The properties of such materials may even be more important than in conventional optical lithography, since the feature sizes delineated by this lithographic technique are much smaller. A description of X-ray resists is presented which discusses both the chemistry and the lithographic properties of these materials. The characterization and stability of these processes are highlighted.
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