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Influence of the preepitaxial annealing and polycrystalline silicon deposition processes on oxygen precipitation and internal gettering in N/N+(100) epitaxial silicon wafers

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2 Author(s)
Wijaranakula, W. ; Materials Characterization Laboratory, SEH America, Incorporated, 4111 Northeast 112th Avenue, Vancouver, Washington 98662 ; Matlock, J.H.

Author(s)

Wijaranakula, W.
Materials Characterization Laboratory, SEH America, Incorporated, 4111 Northeast 112th Avenue, Vancouver, Washington 98662
Matlock, J.H.