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We performed studies of electron emission from ultrananocrystalline diamond (UNCD)-coated, ungated silicon field emitters as a function of in situ exposure to various gases during current versus voltage and current versus time measurements. The emitter arrays were fabricated by a subtractive tip fabrication process and coated with UNCD films using microwave plasma chemical vapor deposition with a CH4/Ar plasma chemistry. The emission characteristics of the coated tip arrays were studied in the diode configuration; using a 2 mm diameter anode with rounded edges to suppress arcing. Significant enhancement of the electron emission was observed, increasing from 35% to 100%, after the emitting surface was exposed to H2 at pressures in the 10-5 and 10-4 Torr range. Upon termination of the H2 exposure, the current decreased to the initial value of 2 μA. The emission current subsequently remained stable at 2 μA upon continued evacuation down to the base pressure below 10-9 Torr. The emission current variation is repeatable with ensuing hydrogen exposure, indicating that the enhancement is due to the hydrogen exposure. Negligible emission current variations are observed at pressures less than 10-5 Torr. Exposure to either Ar or N2 resulted in a reduction of the emission current for ambients of up to 10-5 Torr. This effect is reversible. The effect of the investigated gases on the emission characteristics of UNCD-coated Si tip arrays is attributed to a modification of the effective work function at the localized sites from where elec- trons are being emitted. © 2003 American Institute of Physics.
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