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Fluorine incorporation into gate stacks of advanced silicon memory technologies: Simulation, depth distribution, and reliability

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5 Author(s)
Kruger, D. ; IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany ; Dabrowski, J. ; Gaworzewski, P. ; Kurps, R.
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Author(s)

Kruger, D.
IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
Dabrowski, J. ; Gaworzewski, P. ; Kurps, R. ; Pomplun, K.