An electron cyclotron resonance (ECR) plasma source for broad ion-beam processing has been upgraded by a cylindrically comb-shaped magnetic-field configuration and 11–13GHz frequency microwaves. A pair of comb-shaped magnets surrounds a large-bore discharge chamber. The magnetic field well confines plasmas with suppressing diffusion toward the axial direction of the cylindrical chamber. The magnetic field is constructed with a multipole and two quasiring permanent magnets. The plasma density clearly increases as compared with that in a simple multipole magnetic-field configuration. The frequency of microwaves output from the traveling-wave tube amplifier can be easily changed with an input signal source. The plasma density for 13GHz is higher than that for 11GHz. The maximum plasma density has reached approximately 1018m-3 at a microwave power of only 350W and a pressure of 1.0Pa. The enhancement of plasma generation by second-harmonic resonance and microwave modes has been investigated. The plasma density and the electron temperature are raised around the second-harmonic resonance zone. And then, the ion saturation current is periodically increased with varying the position of the plate tuner. The distance between the peaks is nearly equal to half of the free-space wavelength of microwave. The efficiency of ECR has been improved by using the comb-shaped magnetic field and raising microwave frequency, and then the high-density plasma source has been accomplished at low microwave power.