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Silicon nitride as an effective protection against oxidation of a TiNi thin film in high temperature oxidizing air environment at atmospheric pressure

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4 Author(s)
Roch, I. ; Institut d’Electronique et de Microélectronique du Nord, U.M.R. C.N.R.S. 8520, Avenue Poincaré B.P. 69, 59652 Villeneuve d’Ascq Cedex, France ; Buchaillot, L. ; Wallart, X. ; Collard, D.

Author(s)

Roch, I.
Institut d’Electronique et de Microélectronique du Nord, U.M.R. C.N.R.S. 8520, Avenue Poincaré B.P. 69, 59652 Villeneuve d’Ascq Cedex, France
Buchaillot, L. ; Wallart, X. ; Collard, D.